- 专利标题: Variable resistance memory device and method of manufacturing the same
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申请号: US16014871申请日: 2018-06-21
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公开(公告)号: US10547000B2公开(公告)日: 2020-01-28
- 发明人: Ji-Hyun Jeong , Ilmok Park , Si-Ho Song
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- 代理机构: Muir Patent Law, PLLC
- 优先权: KR10-2017-0136297 20171020
- 主分类号: G11C11/00
- IPC分类号: G11C11/00 ; H01L45/00 ; G11C13/00
摘要:
Disclosed are a variable resistance memory device and a method of manufacturing the same. The device comprises a first conductive line extending in a first direction, a second conductive line extending in a second direction intersecting the first direction, a memory cell at an intersection between the first conductive line and the second conductive line, a first electrode between the first conductive line and the memory cell, and a second electrode between the second conductive line and the memory cell. The memory cell comprises a switching pattern, an intermediate electrode, a first resistivity control pattern, and a variable resistance pattern that are connected in series between the first conductive line and the second conductive line. Resistivity of the first resistivity control pattern is less than resistivity of the second electrode.
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