- 专利标题： Display device including an oxide semiconductor which overlaps an opening
-
申请号： US15874199申请日： 2018-01-18
-
公开(公告)号： US10534235B2公开(公告)日： 2020-01-14
- 发明人: Hitoshi Tanaka , Kazuhide Mochizuki
- 申请人： Japan Display Inc.
- 申请人地址： JP Minato-ku
- 专利权人： Japan Display Inc.
- 当前专利权人： Japan Display Inc.
- 当前专利权人地址： JP Minato-ku
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2017-008620 20170120
- 主分类号： H01L29/10
- IPC分类号： H01L29/10 ; G02F1/1368 ; G02F1/1362 ; H01L27/12 ; H01L29/786 ; G02F1/136 ; G02F1/1343
摘要：
According to one embodiment, a display device includes a gate line extending in a first direction, first and second source lines crossing the gate line and arranged in the first direction, a first light-shielding layer having first and second openings, and an oxide semiconductor layer crossing the gate line, and in the display device, the first opening and the second opening are arranged in a second direction crossing the first direction between the first source line and the second source line, the gate line is located between the first opening and the second opening, and the oxide semiconductor layer has a first overlapping portion overlapping the first opening.
公开/授权文献
- US20180210252A1 DISPLAY DEVICE 公开/授权日：2018-07-26
信息查询
IPC分类:
