Invention Grant
- Patent Title: Mask structure and COA type array substrate
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Application No.: US15539701Application Date: 2017-04-17
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Publication No.: US10459331B2Publication Date: 2019-10-29
- Inventor: Tao Sun
- Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Wuhan, Hubei
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Wuhan, Hubei
- Agent Leong C. Lei
- Priority: CN201710146792 20170313
- International Application: PCT/CN2017/080735 WO 20170417
- International Announcement: WO2018/166027 WO 20180920
- Main IPC: G03F1/36
- IPC: G03F1/36 ; G03F1/00 ; G02F1/1362 ; G02F1/1335 ; G03F7/00

Abstract:
The present invention provides a mask structure and a COA type array substrate. The mask structure comprises a central light shielding portion (1), a peripheral light shielding portion (3) surrounding the central light shielding portion (1) and conforming to an outer contour shape of the central light shielding portion (1) and a circumambient hollow slit (5) sandwiched between the peripheral light shielding portion (3) and the central light shielding portion (1). The exposure light will diffract through the hollow slit (5) to result in the propagation of the reverse bending and the energy intensity gradient. In conjunction with the negative photoresist, the taper of the finally manufactured color filter layer through hole can be made to be gentle to improve the electrical connection quality between the pixel electrodes and the metal material signal lines for avoiding the display failure.
Public/Granted literature
- US20180267397A1 MASK STRUCTURE AND COA TYPE ARRAY SUBSTRATE Public/Granted day:2018-09-20
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