Invention Grant
- Patent Title: Plasma equipment for treating powder
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Application No.: US15719128Application Date: 2017-09-28
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Publication No.: US10418227B2Publication Date: 2019-09-17
- Inventor: Dong Chan Seok , Yong Ho Jung , Hyun Young Jeong
- Applicant: KOREA BASIC SCIENCE INSTITUTE
- Applicant Address: KR Daejeon
- Assignee: KOREA BASIC SCIENCE INSTITUTE
- Current Assignee: KOREA BASIC SCIENCE INSTITUTE
- Current Assignee Address: KR Daejeon
- Agency: Norton Rose Fulbright US LLP
- Priority: KR10-2012-0142764 20121210
- Main IPC: B01J19/08
- IPC: B01J19/08 ; H01J37/32 ; H05H1/24

Abstract:
A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a circular surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the circular surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the circular surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the circular surface discharge plasma module.
Public/Granted literature
- US20180019105A1 PLASMA EQUIPMENT FOR TREATING POWDER Public/Granted day:2018-01-18
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