- 专利标题: Low-friction coating production method and sliding method
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申请号: US15547728申请日: 2016-01-29
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公开(公告)号: US10414996B2公开(公告)日: 2019-09-17
- 发明人: Takahisa Kato , Masataka Nosaka , Mamoru Tohyama , Masahiro Suzuki
- 申请人: JTEKT CORPORATION , THE UNIVERSITY OF TOKYO
- 申请人地址: JP Osaka-shi JP Tokyo
- 专利权人: JTEKT CORPORATION,THE UNIVERSITY OF TOKYO
- 当前专利权人: JTEKT CORPORATION,THE UNIVERSITY OF TOKYO
- 当前专利权人地址: JP Osaka-shi JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2015-015850 20150129; JP2015-015851 20150129; JP2016-008236 20160119; JP2016-008237 20160119
- 国际申请: PCT/JP2016/052680 WO 20160129
- 国际公布: WO2016/121937 WO 20160804
- 主分类号: C23C16/26
- IPC分类号: C23C16/26 ; C10M105/04 ; C10M103/02 ; C23C16/50 ; B05D5/08 ; C10M105/06 ; C10M105/08 ; C10M177/00 ; C10M109/02 ; C23C16/44 ; F16C17/00 ; F16C33/12
摘要:
A method including substituting an atmosphere in a space, in which a sliding surface formed of a metal or a ceramic material, and a slid surface are disposed, with a gas atmosphere containing a hydroxyl group-containing compound and at least one of hydrogen and nitrogen, and relatively sliding the sliding surface against the slid surface by a Hertzian contact stress of 1.0 GPa or more in the space under the gas atmosphere containing the hydroxyl group-containing compound at least one of hydrogen and nitrogen. As a result, it is possible to form, on the sliding surface, a low-friction coating that stably exhibits a significantly low friction coefficient, for example, of 10−4 order (less than 0.001).
公开/授权文献
- US10450527B2 Low-friction coating production method and sliding method 公开/授权日:2019-10-22
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