Invention Grant
- Patent Title: System and method of analyzing integrated circuit in consideration of a process variation
-
Application No.: US15081291Application Date: 2016-03-25
-
Publication No.: US10372869B2Publication Date: 2019-08-06
- Inventor: Moon-Su Kim , Naya Ha , Jong-Ku Kang , Andrew Paul Hoover
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2015-0123198 20150831
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method of analyzing an integrated circuit, which is implemented by a computing system or a processor, wherein an interconnection of a first net of the integrated circuit includes at least one conducting segment corresponding to one wiring layer or one via, includes receiving a plurality of resistances and a plurality of capacitances, which correspond to the first net, based on a process variation, counting a number of conducting segments corresponding to the first net, and calculating a first resistance or a first capacitance of the first net, based on the number of conducting segments, the plurality of resistances, and the plurality of capacitances.
Public/Granted literature
- US20160283643A1 SYSTEM AND METHOD OF ANALYZING INTEGRATED CIRCUIT IN CONSIDERATION OF A PROCESS VARIATION Public/Granted day:2016-09-29
Information query