- 专利标题: Semiconductor device having junctionless vertical gate transistor and method of manufacturing the same
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申请号: US14825030申请日: 2015-08-12
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公开(公告)号: US10361206B2公开(公告)日: 2019-07-23
- 发明人: Jung-Min Moon , Tae-Kyun Kim , Seok-Hee Lee
- 申请人: SK hynix Inc. , Korea Advanced Institute of Science and Technology
- 申请人地址: KR Icheon KR Daejeon
- 专利权人: SK HYNIX INC.,KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- 当前专利权人: SK HYNIX INC.,KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- 当前专利权人地址: KR Icheon KR Daejeon
- 优先权: KR10-2012-0024991 20120312
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L29/78 ; H01L29/66 ; H01L29/10 ; H01L29/423
摘要:
A junctionless vertical gate transistor includes an active pillar vertically protruding from a substrate and including a first impurity region, a second impurity region and a third impurity region sequentially formed over the first impurity region; gate electrodes coupled to sidewalls of the second impurity region; and bit lines arranged in a direction of intersecting with the gate electrodes and each contacting the first impurity region. The first to the third impurity regions include impurities of the same polarity.
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