- 专利标题： Distributed multi-zone plasma source systems, methods and apparatus
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申请号： US13649103申请日： 2012-10-10
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公开(公告)号： US10283325B2公开(公告)日： 2019-05-07
- 发明人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- 申请人： Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Penilla IP, APC
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
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