- 专利标题: Terminal fitting and connector
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申请号: US15770429申请日: 2016-10-18
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公开(公告)号: US10218102B2公开(公告)日: 2019-02-26
- 发明人: Hajime Watanabe , Yoshifumi Saka
- 申请人: AUTONETWORKS TECHNOLOGIES, LTD. , SUMITOMO WIRING SYSTEMS, LTD. , SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 申请人地址: JP Yokkaichi, Mie JP Yokkaichi, Mie JP Osaka-shi, Osaka
- 专利权人: AutoNetworks Technologies, Ltd.,Sumitomo Wiring Systems, Ltd.,SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人: AutoNetworks Technologies, Ltd.,Sumitomo Wiring Systems, Ltd.,SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人地址: JP Yokkaichi, Mie JP Yokkaichi, Mie JP Osaka-shi, Osaka
- 代理机构: Reising Ethington, P.C.
- 优先权: JP2015-218753 20151106
- 国际申请: PCT/JP2016/080868 WO 20161018
- 国际公布: WO2017/077856 WO 20170511
- 主分类号: H01R13/03
- IPC分类号: H01R13/03 ; C25D7/00 ; C25D5/50 ; H01R43/16 ; C25D5/12 ; H01R12/58
摘要:
A terminal fitting that can reduce the terminal insertion force and can suppress surface oxidation of a plating film, even if the terminal fitting is exposed to a hot and humid environment, and a connector that uses the terminal fitting. The terminal fitting includes a metal base material, and the plating film. The plating film includes a Ni foundation layer, an outermost layer exposed at the outermost surface, and a Ni3Sn4 layer formed between the Ni foundation layer and the outermost layer. The outermost layer includes a Sn parent phase, and intermetallic compound that is dispersed in the Sn parent phase, and is made of (Ni0.4Pd0.6)Sn4. The intermetallic compound protrudes from the lower side of the outermost layer to the Ni3Sn4 layer side, and is partially buried in the Ni3Sn4 layer. A connector includes the terminal fitting, and a housing that holds the terminal fitting.
公开/授权文献
- US20180316110A1 TERMINAL FITTING AND CONNECTOR 公开/授权日:2018-11-01
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