Invention Grant
- Patent Title: Valve, fluid control structure, fluid device and method of manufacturing valve
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Application No.: US15172453Application Date: 2016-06-03
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Publication No.: US10100939B2Publication Date: 2018-10-16
- Inventor: Takanori Ichiki , Masashi Kobayashi , Shotaro Terane , Kuno Suzuki
- Applicant: The University of Tokyo , Nikon Corporation
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: THE UNIVERSITY OF TOKYO,NIKON CORPORATION
- Current Assignee: THE UNIVERSITY OF TOKYO,NIKON CORPORATION
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Squire Patton Boggs (US) LLP
- Priority: JP2013-253641 20131206
- Main IPC: B01L99/00
- IPC: B01L99/00 ; B01L3/00 ; F16K7/12 ; F16K7/17 ; B23P15/00 ; F04B43/02 ; F16K99/00
Abstract:
A valve disposed at a flow path includes: a substrate having a first surface in which a hole having an opening section is formed; and a diaphragm member fixed to at least part of a wall surface of the hole and in which at least a central portion has a thin film shape, wherein a flow of a fluid in the flow path is controlled by deforming the diaphragm member.
Public/Granted literature
- US20160319944A1 VALVE, FLUID CONTROL STRUCTURE, FLUID DEVICE AND METHOD OF MANUFACTURING VALVE Public/Granted day:2016-11-03
Information query
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