- 专利标题： Retardation material-forming resin composition, orientation material, and retardation material
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申请号： US15122277申请日： 2015-02-27
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公开(公告)号： US10081693B2公开(公告)日： 2018-09-25
- 发明人: Shojiro Yukawa , Jun Ito , Kohei Goto , Yuta Kanno , Hiroyuki Omura , Tadashi Hatanaka
- 申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 申请人地址： JP Tokyo
- 专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JP2014-039699 20140228; JP2014-140946 20140708
- 国际申请： PCT/JP2015/055969 WO 20150227
- 国际公布： WO2015/129889 WO 20150903
- 主分类号： C08F220/64
- IPC分类号： C08F220/64 ; G02F1/1337 ; C08F2/38 ; C08F220/20 ; G02B1/04 ; G02B5/30 ; C08F120/58 ; C08F212/08 ; C08F220/14 ; C08F220/58 ; C08L25/14 ; C08L33/02 ; G02F1/13363 ; C08F220/36 ; C08F222/10 ; G02B1/08
摘要：
A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable liquid crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.
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