Invention Grant
- Patent Title: Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
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Application No.: US15014829Application Date: 2016-02-03
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Publication No.: US10018924B2Publication Date: 2018-07-10
- Inventor: Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Siegfried Alexander Tromp , Jacobus Josephus Leijssen , Elisabeth Corinne Rodenburg , Maurice Wilhelmus Leonardus Hendricus Feijts , Hendrik Huisman
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; G01J5/20 ; G01J5/02 ; B05D3/02
Abstract:
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
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