- 专利标题: Systems and methods for growing a non-phase separated group-III nitride semiconductor alloy
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申请号: US14860226申请日: 2015-09-21
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公开(公告)号: US10000381B2公开(公告)日: 2018-06-19
- 发明人: Michael William Moseley , William Alan Doolittle
- 申请人: GEORGIA TECH RESEARCH CORPORATION
- 申请人地址: US GA Atlanta
- 专利权人: Georgia Tech Research Corporation
- 当前专利权人: Georgia Tech Research Corporation
- 当前专利权人地址: US GA Atlanta
- 代理机构: Troutman Sanders LLP
- 主分类号: H01L29/30
- IPC分类号: H01L29/30 ; C01B21/06 ; C30B23/02 ; C30B29/40 ; H01L21/02 ; H01L21/205 ; H01L29/20
摘要:
Systems and methods for MBE growing of group-III Nitride alloys, comprising establishing an average reaction temperature range from about 250 C to about 850 C; introducing a nitrogen flux at a nitrogen flow rate; introducing a first metal flux at a first metal flow rate; and periodically stopping and restarting the first metal flux according to a first flow duty cycle. According to another embodiment, the system comprises a nitrogen source that provides nitrogen at a nitrogen flow rate, and, a first metal source comprising a first metal effusion cell that provides a first metal at a first metal flow rate, and a first metal shutter that periodically opens and closes according to a first flow duty cycle to abate and recommence the flow of the first metal from the first metal source. Produced alloys include AlN, InN, GaN, InGaN, and AlInGaN.
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