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发明授权
CN1885169B 光刻装置和器件制造方法 有权

光刻装置和器件制造方法
摘要：
一种光刻装置，包括：构造成支撑构图部件的支撑结构和构造成保持基底的基底台中的至少一个，该构图部件能够将图案赋予辐射光束的截面以形成带图案的辐射光束；其中支撑结构和基底台中的至少一个包括接触表面，构图部件和基底分别与该接触表面接触，该接触表面包括多个分接触表面，以便分别增大支撑结构和构图部件之间以及基底台和基底之间至少之一的相互附着力。
摘要（英）：

A lithographic apparatus is disclosed that has a support structure constructed to support a patterning object, the patterning object being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, or both, wherein the support structure, the substrate table, or both, has a contact surface with which the patterning object, the substrate, or both, are configured to be in contact, respectively, the contact surface having a plurality of sub-contact surfaces to increase a mutual adhesion between the support structure and the patterning object, the substrate table and the substrate, or both.

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