A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or near an intermediate focus of the projection system. Besides a radiationattenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.