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发明公开
CN110504277A 与垂直晶体管组合的垂直溢流漏极 有权

与垂直晶体管组合的垂直溢流漏极
摘要：
本申请案涉及与垂直晶体管组合的垂直溢流漏极。图像传感器像素包含：光电二极管，其安置在半导体材料中以响应于入射在所述半导体材料的背侧上的光而产生图像电荷；以及钉扎层，其安置在所述半导体材料中并耦合到所述光电二极管。所述像素还包含垂直溢流漏极，其安置在所述半导体材料中并且耦合到所述钉扎层，使得所述钉扎层安置在所述垂直溢流漏极与所述光电二极管之间。浮动扩散部靠近所述光电二极管安置在所述半导体材料中，及垂直转移晶体管部分安置在所述半导体材料中并且耦合到所述光电二极管，以响应于施加到所述垂直转移晶体管的所述栅极端子的转移信号而将所述图像电荷从所述光电二极管转移到所述浮动扩散部。
摘要（英）：

The invention relates to a vertical overflow drain combined with a vertical transistor. An image sensor pixel includes a photodiode disposed in a semiconductor material to generate image charge in response to light incident on a backside of the semiconductor material, and a pinning layer disposed in the semiconducting material and coupled to the photodiode. The pixel also includes a vertical overflow drain disposed in the semiconductor material and coupled to the pinning layer such that the pinning layer is disposed between the vertical overflow drain and the photodiode. A floating diffusion disposed in the semiconductor material proximate to the photodiode, and a vertical transfer transistor is disposed in part in the semiconductor material and coupled to the photodiode to transfer the image charge from the photodiode to the floating diffusion in response to a transfer signal applied to the gate terminal of the vertical transfer transistor.

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