The invention discloses a multi-range double probe device for measuring the thickness of a metal film. The device includes an excitation source, a double probe, a collection module and a central processing module, wherein the excitation source is used for providing an oscillating source, the double probe has a first coil channel and a second coil channel and correspondingly includes a first coil and a second coil, the penetration depth of the second coil being larger than that of the first coil, the collection module is used for generating magnetic field right below the probe and collecting the equivalent impedance of the probe when generating induced magnetic field on the surface of a to-be-measured metal film right below the probe, and the central processing module is used for switchingthe coil channels to make the first coil or the second coil work, obtaining the changing values of coil impedance according to the equivalent impedance, and obtaining the thickness of the to-be-measured metal film according to the changing values of the coil impedance. The device can measure the thickness of the metal films through a non-contact manner, and therefore, fixed point coordinate measurement can be performed, film edge measurement can be performed, and the resolution and stability of the probe can be effectively enhanced.