The invention discloses a resist composition which generates acid due to exposure and therefore changes solubility of a developer via the action of the acid. The resist composition is characterized by comprising a base component (A) which changes the solubility of the developer from the action of the acid and an acid generator component (B) which generates an acid by exposure, and the acid generator component (B) comprises a compound (B1) represented by the general formula (b1). In the general formula (b1), Rb1 represents an alicyclic group having bridging bonds containing 7 to 30 carbon atoms containing a polar group. Yb1 represents a linear hydrocarbon group having 9 or more carbon atoms which may have a substituent (wherein a substituent selected from an aromatic hydrocarbon group and a vinyl group is excluded). Vb1 represents a fluoroalkylene group. m is an integer of 1 or more, and Mm + represents an organic cation of m valence.