The present invention discloses a method for making discontinuous linear pattern and a discontinuous linear pattern structure. The method comprises: forming a DSA material layer on a substrate, and forming a periodicity arrangement pattern after the phase separation making technology, wherein the periodicity arrangement pattern includes a plurality of first polymer structures and a plurality of second polymer structures which are alternately arranged. The first mask is formed on the DSA material layer to cover the first portion of the periodicity arrangement pattern, the first polymer structures exposed by the first mask are removed, and the first mask is removed. A second mask is formed to cover the second portion of the periodicity arrangement pattern, wherein there is a gap arranged between the first portion and the second portion. The second polymer structures exposed by the second mask are removed, and finally the second mask is removed. The reserved part of the first polymer structures and the part of the second polymer structures are not connected with each other.