The invention provides an MOCVD equipment spray head. The MOCVD equipment spray head comprises an MO source channel, a protective gas channel, an oxygen source channel, an observation channel and a reaction cavity, wherein an MO source gas and a protective gas directly reach the interior of the reaction cavity through the MO source channel and the protective gas channel respectively; an oxygen source gas is dispersed through a buffer cavity and then reaches the reaction cavity through the oxygen source channel; the protective gas channel is arranged between the MO source channel and the oxygen source channel; and the protective gas forms a gas wall in the reaction cavity so as to prevent pre-mixing of the MO source gas and the oxygen source gas in the reaction cavity before reaching a rotary base, thus the quality of film growth of MOCVD equipment is improved. According to the MOCVD equipment spray head provided by the invention, the thickness and the length of the gas wall can be controlled through controlling the flow rate of the protective gas, and the quality of film growth can be accurately controlled through designing the observation channel, the MO source channel, the protective gas channel and the oxygen source channel, so as to obtain a high-quality film.