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发明公开
CN104934347A 基板处理装置及方法 无效 - 撤回

基板处理装置及方法
摘要：
本发明提供基板处理装置及方法。基板处理装置具有工序处理腔室、空气排出腔室、装载互锁腔室、及排气单元等。空气排出腔室以比工序处理腔室中的减压速度更慢的速度减压来排出处理对象物内的空气，从而防止基板的扭曲(Warpage)现象。空气排出腔室一次对多个处理对象物进行空气排出处理，从而能够缩短工序时间。
摘要（英）：

The invention provides a substrate treatment device and method. The substrate treatment device comprises a process treatment chamber, an air discharge chamber, a loading interlocking chamber and an exhaust unit. The air discharge chamber discharges air in a treatment object through pressure reduction with a speed lower than that of the pressure reduction of the process treatment chamber, so that the warpage of substrates is prevented. The air discharge chamber performs air discharge treatment on a plurality of treatment objects at the same time, so that the process time is shortened.

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