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CN104662049A 光固化性组合物及使用该组合物的膜的制造方法 有权 复审申请

  • Patent Title: 光固化性组合物及使用该组合物的膜的制造方法
  • Patent Title (English): Photocurable composition and method of manufacturing film using the composition
  • Application No.: CN201380048860.6
    Application Date: 2013-09-11
  • Publication No.: CN104662049A
    Publication Date: 2015-05-27
  • Inventor: 伊藤俊树 , 三原知恵子 , 川崎阳司
  • Applicant: 佳能株式会社
  • Applicant Address: 日本东京都大田区下丸子3丁目30番2号
  • Assignee: 佳能株式会社
  • Current Assignee: 佳能株式会社
  • Current Assignee Address: 日本东京都大田区下丸子3丁目30番2号
  • Agency: 北京魏启学律师事务所
  • Agent 魏启学
  • Priority: 2012-205551 2012.09.19 JP; 2013-028701 2013.02.18 JP
  • International Application: PCT/JP2013/075211 2013.09.11
  • International Announcement: WO2014/046150 EN 2014.03.27
  • Date entered country: 2015-03-19
  • Main IPC: C08F2/48
  • IPC: C08F2/48 ;  H01L21/768 ;  H01L23/532 ;  H05K3/10
光固化性组合物及使用该组合物的膜的制造方法
Abstract:
提供一种具有高填充性并能够在通过利用光压印法生产膜时降低脱模力的光固化性组合物，和使用该光固化性组合物的膜的制造方法。光固化性组合物为包括至少下列组分(A)至组分(C)的光固化性组合物：(A)可聚合化合物；(B)光聚合引发剂；和(C)由下列通式(1)表示的表面活性剂：Rf1-Rc-X (1)。
Abstract(English):

Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition. The photocurable composition is a photocurable composition, including at least the following component (A) to component (C): (A) a polymerizable compound; (B) a photopolymerization initiator; and (C) a surfactant represented by the following general formula (1): Rf1-Rc-X (1).

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