The invention discloses a multi-hole pyramid antireflection structure preparation method and an HIT solar cell preparation technology. The multi-hole pyramid antireflection structure preparation method comprises the following steps that 1) cleaning and texturing are conducted on a monocrystal silicon substrate to enable the surface of the substrate to form a flock face of a pyramid structure, 2) the monocrystal silicon substrate of the pyramid structure is submerged into an acid solution to be processed; (3) a reactive ion etching method is used for etching the monocrystal silicon substrate processed in the step 2), and a nanometer structure is prepared on the pyramid structure to enable a multi-hole pyramid structure to be formed on the surface of the monocrystal silicon substrate processed in the step 2); 4) alkali etching is conducted on the monocrystal silicon substrate processed in the step 3), and a multi-hole pyramid antireflection structure on the surface of a solar cell is obtained. According to the multi-hole pyramid antireflection structure preparation method and the HIT solar cell preparation technology, the reflectivity of the substrate is reduced, short-circuit current density is improved, the passivation effect of the substrate is improved, the open-circuit voltage of the cell is appropriately improved, and transfer efficiency of the cell is improved.