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发明授权
CN101577216B 等离子反应器 失效 - 权利终止 转让

等离子反应器
摘要：
本发明提供了一种等离子化学反应器。所述的反应器包括一个空腔，一个阴极装置和一块挡板。所述的空腔提供了一个等离子反应的空间。所述的阴极装置包括一个阴极支撑杆和一个基托。所述的阴极支撑杆一端与空腔的一个壁面连接，另一端与基托连接。所述的基托用于支撑基板。所述的挡板从外面插入基托并与之连接，挡板上间隔地设有多个穿过挡板的穿孔用来排放反应气体，这些穿孔是不均匀设置的，其中在阴极支撑杆顶侧处的一个穿孔面积要大于远离阴极支撑杆一侧处的一个穿孔面积。
摘要（英）：

A plasma chemical reactor is provided. The reactor includes a chamber, a cathode assembly, and a baffle plate. The chamber forms a plasma reaction space. The cathode assembly includes a cathode support shaft and a substrate support. The cathode support shaft is coupled at one side to a wall surface of the chamber. The substrate support is coupled to the other side of the cathode support shaft andsupports the substrate. The baffle plate is out inserted and coupled to the substrate support, and has a plurality of vents arranged to be spaced apart and through formed such that reaction gas can pass through, and the vents asymmetrically arranged and formed to get a vent area smaller at an opposite side than a top side of the cathode support shaft.

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