The invention relates to a semiconductor chip processing technology, in particular to an improved structure of a coating and developing processing technology and the equipment thereof which can save time. The coating and developing equipment comprises a coating unit, a developing unit, a heat disc unit, a cold disc unit, a pretreatment tackifying unit, a box station, a box station robot, a processing robot, an aligning unit and a chip box; wherein, a transmission mechanism and a clamping mechanism are additionally arranged between the heat disc unit and the cold disc unit, and are responsiblefor sending chips after being heated on the heat disc to the cold disc to cool off, the transmission by the processing robot is not required; therefore the times of using the processing robot is reduced, the whole processing transmission time is reduced, and the working efficiency of the coating and developing equipment is enhanced.