公开(公告)号：US20160004125A1

公开(公告)日：2016-01-07

申请号：US14437132

申请日：2014-10-14

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Wenbo LI ,  Chunyan JI

IPC: G02F1/1337 ,  C09K19/56 ,  G02F1/1335

CPC classification number: G02F1/133711 ,  C09K19/56 ,  G02F1/133514 ,  G02F1/133788 ,  G02F2001/133796 ,  G02F2202/36 ,  G03F1/10 ,  G03F1/106 ,  G03F1/42 ,  H05K3/10 ,  H05K3/102 ,  H05K3/107 ,  H05K3/12

Abstract: Disclosed are a conductive alignment layer, a manufacture method of the conductive alignment layer, a display substrate comprising the conductive alignment layer and a display device which relate to the technology of LCD, simplify the manufacture method of conductive layer and alignment layer and also reduce the complexity in manufacturing a LCD device by preparing the conductive layer and the alignment layer in the substrate simultaneously through utilizing a material possessing both conductivity and alignment, without the need of preparing the conductive layer and the alignment layer separately.

Abstract translation: 公开了一种导电取向层，导电取向层的制造方法，包括导电取向层的显示基板和与LCD技术有关的显示装置，简化了导电层和取向层的制造方法，还减少了 通过利用具有导电性和对准性的材料同时制备导电层和衬底中的取向层，而不需要分别制备导电层和取向层，从而制造LCD器件的复杂性。

公开(公告)号：US08746169B2

公开(公告)日：2014-06-10

申请号：US12986894

申请日：2011-01-07

Applicant: Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

Inventor： Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

IPC: B05C11/00 ,  C25D1/10 ,  C23C16/00 ,  C23C14/04 ,  H01L51/00 ,  C23C14/12

CPC classification number: C23C14/042 ,  C23C14/12 ,  C25D1/10 ,  G03F1/10 ,  H01L51/0011

Abstract: A mask frame assembly for thin film deposition includes a frame having an opening and at least two unit masks having end parts in a longitudinal direction fixed to the frame, each of the unit masks comprising first regions and second regions, the first regions having unit masking patterns, each of the unit masking patterns having a plurality of openings for thin film deposition, the unit masking pattern being spaced apart from each other, each of the second regions being interposed between a pair of adjacent ones of the first regions, the first regions having a first thickness from a first surface of the unit masks, and at least a portion of the second regions having a second thickness from a second surface of the unit masks opposite to the first surface of the unit masks, such that the first regions and the at least the portion of the second regions are offset from each other in a direction normal to the first and second surfaces. A plurality of unit masks are each half etched from different surfaces and thus a height of wrinkles generated in the mask of the mask frame assembly may be reduced.

Abstract translation: 用于薄膜沉积的掩模框架组件包括具有开口的框架和至少两个单元掩模，其具有沿着固定到框架的纵向方向上的端部，每个单元掩模包括第一区域和第二区域，第一区域具有单元屏蔽 图案，每个单位掩模图案具有多个用于薄膜沉积的开口，单元掩模图案彼此间隔开，每个第二区域插入在一对相邻的第一区域之间，第一区域 具有来自所述单元掩模的第一表面的第一厚度，并且所述第二区域的至少一部分具有来自所述单元的第二表面的第二厚度，掩模与所述单元掩模的第一表面相反，使得所述第一区域和 所述第二区域的至少所述部分在垂直于所述第一和第二表面的方向上彼此偏移。 多个单元掩模每个从不同的表面被半蚀刻，因此可以减少在掩模框组件的掩模中产生的皱纹的高度。

公开(公告)号：US20110168087A1

公开(公告)日：2011-07-14

申请号：US12986894

申请日：2011-01-07

Applicant: Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

Inventor： Choong-Ho Lee ,  Jung-Min Lee ,  Yoon-Chan Oh

IPC: C25D1/10 ,  B05C11/00

CPC classification number: C23C14/042 ,  C23C14/12 ,  C25D1/10 ,  G03F1/10 ,  H01L51/0011

Abstract: A mask frame assembly for thin film deposition includes a frame having an opening and at least two unit masks having end parts in a longitudinal direction fixed to the frame, each of the unit masks comprising first regions and second regions, the first regions having unit masking patterns, each of the unit masking patterns having a plurality of openings for thin film deposition, the unit masking pattern being spaced apart from each other, each of the second regions being interposed between a pair of adjacent ones of the first regions, the first regions having a first thickness from a first surface of the unit masks, and at least a portion of the second regions having a second thickness from a second surface of the unit masks opposite to the first surface of the unit masks, such that the first regions and the at least the portion of the second regions are offset from each other in a direction normal to the first and second surfaces. A plurality of unit masks are each half etched from different surfaces and thus a height of wrinkles generated in the mask of the mask frame assembly may be reduced.

Abstract translation: 用于薄膜沉积的掩模框架组件包括具有开口的框架和至少两个单元掩模，其具有沿着固定到框架的纵向方向上的端部，每个单元掩模包括第一区域和第二区域，第一区域具有单元屏蔽 图案，每个单位掩模图案具有多个用于薄膜沉积的开口，单元掩模图案彼此间隔开，每个第二区域插入在一对相邻的第一区域之间，第一区域 具有来自所述单元掩模的第一表面的第一厚度，并且所述第二区域的至少一部分具有来自所述单元的第二表面的第二厚度，掩模与所述单元掩模的第一表面相反，使得所述第一区域和 所述第二区域的至少所述部分在垂直于所述第一和第二表面的方向上彼此偏移。 多个单元掩模每个从不同的表面被半蚀刻，因此可以减少在掩模框组件的掩模中产生的皱纹的高度。