公开(公告)号：US20130312666A1

公开(公告)日：2013-11-28

申请号：US13549929

申请日：2012-07-16

Applicant: Yu-Chiu Shih ,  Hsiu-Po Liu

Inventor： Yu-Chiu Shih ,  Hsiu-Po Liu

IPC: C23C16/458

CPC classification number: B05C3/18 ,  B05C3/109 ,  B05C9/08 ,  B05D1/18 ,  B05D2252/00 ,  C23C18/02 ,  C23C18/06 ,  C23C18/1614 ,  C23C18/1619 ,  H01L21/67126 ,  H01L21/6719

Abstract: An apparatus for depositing a thin film basically consists of a base, two lateral boards and two sealing members to form a closed chamber therein. Each lateral board is provided with a substrate on an inner side thereof. Each substrate has a side in contact with a chemical solution in the chamber to deposit a thin film on the side of the substrate through a chemical reaction.

Abstract translation: 用于沉积薄膜的装置基本上由基底，两个侧板和两个密封构件组成，以在其中形成封闭室。 每个侧板在其内侧设置有基板。 每个衬底具有与室中的化学溶液接触的一侧，以通过化学反应在衬底的侧面上沉积薄膜。