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1.发明授权High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter 失效用于带状光束的高质量分辨率低像差分析器磁体和用于带状束离子注入机的系统公开(公告)号：US08183539B2
公开(公告)日：2012-05-22
申请号：US12658679
申请日：2010-02-12
Applicant: Yongzhang Huang , Xinping Hu
Inventor： Yongzhang Huang , Xinping Hu
CPC classification number: H01J37/3171 , H01J37/05 , H01J37/153 , H01J2237/057 , H01J2237/08
Abstract: The present invention provides a mass analyzing magnet which can bend a very wide charged particle ribbon beams through angles between 90 to 200 degrees. The shorter dimension of the ribbon beam is aligned with the magnetic field. The magnet can focus the longer dimension of the ribbon beam through a resolving slot inside the magnet for mass or momentum analysis. The magnet pole is shaped to increase the mass resolving power and to provide the focusing force in the direction of the shorter dimension of the ribbon beam. This magnet can achieve high mass resolving power with very small system aberrations for very wide ribbon beam. This feature is of significant value, for example, in the ion implantation industry. The ribbon beam width can be 300 mm, 450 mm and even 1000 mm. Integrated with the present invention, the ion implanter systems can be built to provide mass analyzed ribbon beams for various applications. The system will have much lower cost and much better ribbon beam quality than the ion implanters which are using conventional mass analyzing magnet.
Abstract translation: 本发明提供一种质量分析磁体，其能够使非常宽的带电粒子束弯曲角度在90至200度之间。 带状束的较短尺寸与磁场对准。 磁体可以将带状光束的较长尺寸聚焦在磁体内的分辨槽以进行质量或动量分析。 磁极被成形为增加质量分辨能力并且提供在带状束的较短尺寸方向上的聚焦力。 该磁体可以实现高质量分辨率功率，对于非常宽的带状束具有非常小的系统像差。 这个特征具有重要价值，例如在离子注入工业中。 带束宽度可以是300mm，450mm甚至1000mm。 与本发明相结合，可以构建离子注入机系统以提供用于各种应用的质量分析的带状束。 与使用常规质量分析磁体的离子注入机相比，该系统将具有更低的成本和更好的带束质量。
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2.发明申请High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter 失效用于带状光束的高质量分辨率低像差分析器磁体和用于带状束离子注入机的系统公开(公告)号：US20100243879A1
公开(公告)日：2010-09-30
申请号：US12658679
申请日：2010-02-12
Applicant: Yongzhang Huang , Xinping Hu
Inventor： Yongzhang Huang , Xinping Hu
CPC classification number: H01J37/3171 , H01J37/05 , H01J37/153 , H01J2237/057 , H01J2237/08
Abstract: The present invention provides a mass analyzing magnet which can bend a very wide charged particle ribbon beams through angles between 90 to 200 degrees. The shorter dimension of the ribbon beam is aligned with the magnetic field. The magnet can focus the longer dimension of the ribbon beam through a resolving slot inside the magnet for mass or momentum analysis. The magnet pole is shaped to increase the mass resolving power and to provide the focusing force in the direction of the shorter dimension of the ribbon beam. This magnet can achieve high mass resolving power with very small system aberrations for very wide ribbon beam. This feature is of significant value, for example, in the ion implantation industry. The ribbon beam width can be 300 mm, 450 mm and even 1000 mm. Integrated with the present invention, the ion implanter systems can be built to provide mass analyzed ribbon beams for various applications. The system will have much lower cost and much better ribbon beam quality than the ion implanters which are using conventional mass analyzing magnet.
Abstract translation: 本发明提供一种质量分析磁体，其能够使非常宽的带电粒子束弯曲角度在90至200度之间。 带状束的较短尺寸与磁场对准。 磁体可以将带状光束的较长尺寸聚焦在磁体内的分辨槽以进行质量或动量分析。 磁极被成形为增加质量分辨能力并且提供在带状束的较短尺寸方向上的聚焦力。 该磁体可以实现高质量分辨率功率，对于非常宽的带状束具有非常小的系统像差。 这个特征具有重要价值，例如在离子注入工业中。 带束宽度可以是300mm，450mm甚至1000mm。 与本发明相结合，可以构建离子注入机系统以提供用于各种应用的质量分析的带状束。 与使用常规质量分析磁体的离子注入机相比，该系统将具有更低的成本和更好的带束质量。
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