公开(公告)号：US20190094696A1

公开(公告)日：2019-03-28

申请号：US15739782

申请日：2017-10-18

Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.

Inventor： Lei DING

IPC: G03F7/20 ,  G03F7/004 ,  G02B7/00

Abstract: An exposure apparatus includes a carrying device and a UV light generation device that irradiate a transparent substrate positioned on the carrying device. The carrying device includes a base, a linear electric machine, an exposure table, and a pneumatic lift device that is arranged between the exposure table and the base and supports the exposure table on the base. A stator of the linear electric machine is fixed to the base, and a rotor of the linear electric machine is fixedly coupled to the exposure table. The linear electric machine drives the exposure table to move relative to the base. A method for exposure of a transparent substrate is also provided. The linear electric machine only needs to drive the movement of the exposure table thereby helping increase exposure speed and exposure accuracy. The pneumatic lift device provides an additional function of cushioning.