Abstract:
A rotary turbine cleaning device for cleaning semiconductor fabrication equipment works in conjunction with a clean room vacuum or other vacuum or other air pump. The fluid flow created by the vacuum action causes the rotors of the turbine assembly to rotate, thereby rotating the cleaning head. Attached to the cleaning head are bristles or other cleaning media which may dislodge particles from surfaces. The dislodged particles are drawn into the tube through an opening at the end of the tube and the vacuum action. In some embodiments, a lumen delivers a cleaning fluid to the cleaning head.
Abstract:
An apparatus and method for qualifying a filter used to filter fluid used in a coating operation associated with photolithography or other semiconductor manufacturing processes, provides a semiconductor manufacturing tool that includes a filter and an acoustic wave generator. The filter may be housed inside a filter housing and the acoustic wave generator may produce ultrasonic, megasonic or other acoustic energy. The acoustic wave generator contacts or is in close proximity with the filter housing and provides acoustic wave energy to the filter through the housing. The acoustic wave energy causes any bubbles in the filter to become disengaged.