公开(公告)号：US09381056B2

公开(公告)日：2016-07-05

申请号：US14553552

申请日：2014-11-25

Applicant: The Texas A&M University System

Inventor： David Staack ,  Tsung-Chan Tsai

IPC: A61M37/00 ,  A61B18/04 ,  A61L2/14 ,  B05D1/00 ,  C23C16/06 ,  C23C16/503 ,  C23C16/52

CPC classification number: A61B18/042 ,  A61L2/14 ,  A61L2202/11 ,  B05D1/62 ,  C23C16/06 ,  C23C16/503 ,  C23C16/52

Abstract: A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.

Abstract translation: 提供了一种用于在生物衬底上沉积膜的方法和装置。 等离子体产生装置包括电介质导管和高压电极。 将等离子体产生装置放置在生物基板附近，并且包括前体材料的气体供应被引导通过介电导管。 由高电压电极和生物体之间的电位差产生的电场使至少一部分气体供给离子化，并使等离子体从电介质导管发出并与生物基板接触。 等离子体引起前体材料的反应以形成沉积在生物基底上的膜。