Method and Apparatus for Inspecting Defects
    1.
    发明申请
    Method and Apparatus for Inspecting Defects 失效
    检查缺陷的方法和装置

    公开(公告)号:US20100014083A1

    公开(公告)日:2010-01-21

    申请号:US12504972

    申请日:2009-07-17

    CPC classification number: G01N21/9501 G01N2021/4792 G01N2021/8848

    Abstract: An apparatus for inspecting a substrate surface is provided, which includes illumination optics for irradiating the substrate surface linearly with rectilinearly polarized light from an oblique direction, detection optics for acquiring images of the substrate surface, each of the images being formed by the light scattered from the light-irradiated substrate surface, and means for comparing an image selected as an inspection image from the plurality of substrate surface images that the detection optics has acquired to detect defects, and another image selected from the plural images of the substrate surface as a reference image different from the inspection image; the illumination optics being formed with polarization control means for controlling a polarizing direction of the light according to a particular scanning direction of the substrate or a direction orthogonal to the scanning direction.

    Abstract translation: 提供了一种用于检查基板表面的装置,其包括用于从倾斜方向线性地用直线偏振光线照射基板表面的照明光学装置,用于获取基板表面的图像的检测光学装置,每个图像由从 光照射的基板表面,以及用于将从检测光学器件已经获取的多个基板表面图像中选择为检查图像的图像与检测缺陷进行比较的装置,以及从基板表面的多个图像中选择的另一图像作为参考 图像与检查图像不同; 所述照明光学元件形成有偏振控制装置,用于根据所述基板的特定扫描方向或与扫描方向正交的方向来控制所述光的偏振方向。

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