公开(公告)号：US09725312B1

公开(公告)日：2017-08-08

申请号：US15016527

申请日：2016-02-05

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chien-Ning Hsin ,  I-Shi Wang ,  Jen-Hao Liu ,  Chih-Hang Chang

IPC: H01L21/76 ,  B81C1/00 ,  H01L21/02

CPC classification number: B81C1/00357 ,  B81C1/00269 ,  B81C2203/036 ,  B81C2203/037 ,  H01L21/02334 ,  H01L21/02337 ,  H01L21/2007 ,  H01L21/3105

Abstract: A method for fusion bonding a pair of substrates together with silane preconditioning is provided. A surface of a first oxide layer or a surface of a second oxide layer is preconditioned with silane. The first and second oxide layers are respectively arranged on first and second semiconductor substrates. Water is applied to the surface of the first or second oxide layer. The surfaces of the first and second oxide layers are brought in direct contact. The first and second oxide layers are annealed. A method for manufacturing a microelectromechanical systems (MEMS) package using the fusion bonding is also provided.

公开(公告)号：US20170225948A1

公开(公告)日：2017-08-10

申请号：US15016527

申请日：2016-02-05

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chien-Ning Hsin ,  I-Shi Wang ,  Jen-Hao Liu ,  Chih-Hang Chang

IPC: B81C1/00

CPC classification number: B81C1/00357 ,  B81C1/00269 ,  B81C2203/036 ,  B81C2203/037 ,  H01L21/02334 ,  H01L21/02337 ,  H01L21/2007 ,  H01L21/3105

Abstract: A method for fusion bonding a pair of substrates together with silane preconditioning is provided. A surface of a first oxide layer or a surface of a second oxide layer is preconditioned with silane. The first and second oxide layers are respectively arranged on first and second semiconductor substrates. Water is applied to the surface of the first or second oxide layer. The surfaces of the first and second oxide layers are brought in direct contact. The first and second oxide layers are annealed. A method for manufacturing a microelectromechanical systems (MEMS) package using the fusion bonding is also provided.