ARRANGEMENT FOR MONITORING AN OPTICAL ELEMENT, LASER SOURCE AND EUV RADIATION GENERATION APPARATUS

    公开(公告)号:US20210351554A1

    公开(公告)日:2021-11-11

    申请号:US17381205

    申请日:2021-07-21

    IPC分类号: H01S3/04

    摘要: An arrangement monitors an optical element. The arrangement includes: a light source configured to emit radiation onto a surface of the optical element; a detector configured to detect the radiation that has been at least partially reflected at the surface of the optical element; and a holder for the optical element, in which the light source and the detector are integrated. The holder has a cooling region through which a cooling liquid is configured to flow, the cooling region being in contact with the optical element. The holder has a reservoir, through which a beam path between the light source and the detector extends. The reservoir is configured to receive the cooling liquid leaking out at the optical element in case of a leakage.

    Arrangement for monitoring an optical element, laser source and euv radiation generation apparatus

    公开(公告)号:US11322902B2

    公开(公告)日:2022-05-03

    申请号:US17381205

    申请日:2021-07-21

    IPC分类号: H01S3/04

    摘要: An arrangement monitors an optical element. The arrangement includes: a light source configured to emit radiation onto a surface of the optical element; a detector configured to detect the radiation that has been at least partially reflected at the surface of the optical element; and a holder for the optical element, in which the light source and the detector are integrated. The holder has a cooling region through which a cooling liquid is configured to flow, the cooling region being in contact with the optical element. The holder has a reservoir, through which a beam path between the light source and the detector extends. The reservoir is configured to receive the cooling liquid leaking out at the optical element in case of a leakage.