公开(公告)号：US09977328B2

公开(公告)日：2018-05-22

申请号：US15006473

申请日：2016-01-26

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Yuta Yamamoto ,  Yasushi Kuroiwa

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A chemically amplified positive-type photosensitive resin composition for a thick film including an acid generator which is capable of producing an acid when irradiated with an active beam or radiation and includes a compound having a carboxyl group; a resin whose solubility in alkali increases under the action of an acid and which includes an acrylic resin containing a structural unit derived from acrylic ester having a cyclic group containing —SO2— or a cyclic group containing lactone; and an organic solvent.

公开(公告)号：US20160231651A1

公开(公告)日：2016-08-11

申请号：US15006473

申请日：2016-01-26

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Yuta Yamamoto ,  Yasushi Kuroiwa

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A chemically amplified positive-type photosensitive resin composition for a thick film including an acid generator which is capable of producing an acid when irradiated with an active beam or radiation and includes a compound having a carboxyl group; a resin whose solubility in alkali increases under the action of an acid and which includes an acrylic resin containing a structural unit derived from acrylic ester having a cyclic group containing —SO2— or a cyclic group containing lactone; and an organic solvent.

Abstract translation: 一种用于厚膜的化学放大正型感光性树脂组合物，其包括酸产生剂，其能够在用活性束或辐射照射时能够产生酸，并且包括具有羧基的化合物; 一种在酸的作用下在碱中的溶解度增加的树脂，其包含含有衍生自含有-SO 2 - 的环状基团的丙烯酸酯或含有内酯的环状基团的结构单元的丙烯酸树脂; 和有机溶剂。

公开(公告)号：US20150268557A1

公开(公告)日：2015-09-24

申请号：US14662636

申请日：2015-03-19

Applicant: Tokyo Ohka Kogyo Co., Ltd.

Inventor： Makiko Irie ,  Aya Momozawa ,  Yuta Yamamoto

IPC: G03F7/039 ,  G03F7/30

CPC classification number: G03F7/0392 ,  G03F7/0397 ,  G03F7/09 ,  G03F7/20 ,  G03F7/40 ,  H05K2203/0514

Abstract: A chemically amplified positive-type photosensitive resin composition for thick-film application capable of forming a resist pattern having a nonresist section with a good rectangular cross-sectional shape under a low exposure level even when a resist pattern having a film thickness of 10 μm or more is formed. A chemically amplified positive-type photosensitive resin composition for thick-film application comprising an acid generator and an organic solvent, in which an acrylic resin is added that contains a constituent unit derived from an acrylic acid ester comprising an —SO2— containing cyclic group or a lactone-containing cyclic group as a resin whose solubility in alkali increases under the action of acid.

Abstract translation: 一种用于厚膜施加的化学放大型正型感光性树脂组合物，即使在膜厚为10μm的抗蚀剂图案的情况下，也能够在低曝光水平下形成具有良好矩形截面形状的非阻挡部分的抗蚀剂图案， 更多的形成。 一种用于厚膜应用的化学放大型正型感光性树脂组合物，其包含酸产生剂和有机溶剂，其中添加含有源自含-SO2-的环状基团的丙烯酸酯的构成单元的丙烯酸树脂，或 含有内酯的环状基团，其在碱的作用下在碱中的溶解度增加。

公开(公告)号：US11022880B2

公开(公告)日：2021-06-01

申请号：US16160297

申请日：2018-10-15

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Akiya Kawaue ,  Yuta Yamamoto ,  Kazuaki Ebisawa ,  Yasushi Kuroiwa

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  G03F7/16 ,  G03F7/32 ,  C07D493/08 ,  C07C323/61 ,  G03F7/20 ,  G03F7/40 ,  C07D307/93 ,  C07D249/12 ,  C07C323/62 ,  C07D249/10 ,  C07D249/06 ,  C07C321/22 ,  C07D495/08 ,  C07C321/24

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

公开(公告)号：US10890845B2

公开(公告)日：2021-01-12

申请号：US15499026

申请日：2017-04-27

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Kazuaki Ebisawa ,  Yuta Yamamoto

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  C23C18/16 ,  G03F7/039 ,  C25D5/02 ,  G03F7/16 ,  G03F7/38 ,  G03F7/40

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing occurrence of footing in which the width of the bottom becomes narrower than that of the top in a nonresist section, denaturation of the surface of the metal substrate, and occurrence of a development residue, when a resist pattern serving as a template for a plated article is formed on a metal surface of the substrate having the metal surface by using the composition; a method for manufacturing a substrate with a template by using the composition; and a method for manufacturing a plated article using the substrate with the template. A mercapto compound having a specific structure is contained in the chemically resin composition which includes an acid generator, and a resin whose solubility in alkali increases under the action of acid.

公开(公告)号：US09448478B2

公开(公告)日：2016-09-20

申请号：US14662636

申请日：2015-03-19

Applicant: Tokyo Ohka Kogyo Co., Ltd.

Inventor： Makiko Irie ,  Aya Momozawa ,  Yuta Yamamoto

IPC: G03F7/039 ,  G03F7/09 ,  G03F7/20 ,  G03F7/40

CPC classification number: G03F7/0392 ,  G03F7/0397 ,  G03F7/09 ,  G03F7/20 ,  G03F7/40 ,  H05K2203/0514

Abstract: A chemically amplified positive-type photosensitive resin composition for thick-film application capable of forming a resist pattern having a nonresist section with a good rectangular cross-sectional shape under a low exposure level even when a resist pattern having a film thickness of 10 μm or more is formed. A chemically amplified positive-type photosensitive resin composition for thick-film application comprising an acid generator and an organic solvent, in which an acrylic resin is added that contains a constituent unit derived from an acrylic acid ester comprising an —SO2-containing cyclic group or a lactone-containing cyclic group as a resin whose solubility in alkali increases under the action of acid.

Abstract translation: 一种用于厚膜施加的化学放大型正型感光性树脂组合物，即使在膜厚为10μm的抗蚀剂图案的情况下，也能够在低曝光水平下形成具有良好矩形截面形状的非阻挡部分的抗蚀剂图案， 更多的形成。 一种用于厚膜施加的化学放大正型感光性树脂组合物，其包含酸产生剂和有机溶剂，其中添加含有源自包含-SO 2的环状基团的丙烯酸酯的构成单元的丙烯酸树脂或 含有内酯的环状基团，其在碱的作用下在碱中的溶解度增加。