公开(公告)号：US20240402604A1

公开(公告)日：2024-12-05

申请号：US18699225

申请日：2022-10-18

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Rin Odashima ,  Hiroki Kato

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: A resist composition containing a resin component (A1) and a photodecomposable base (D0) represented by General Formula (d0) that generates a carboxylic acid having a pKa of 0.50 or more as a generated acid. In the formula, Rm represents a hydrogen atom or a hydroxy group, X0 represents a bromine atom or an iodine atom, Yd0 represents a divalent linking group or a single bond, Rb1 represents a fluorine atom or a fluorinated alkyl group, p01 represents an integer in a range of 1 to 5, and Rb2 and Rb3 are hydrocarbon groups, provided that at least one Rb1 is bonded to an ortho-position or a meta-position of a benzene ring, and the number of all fluorine atoms contained in —F and/or —CFRx1Rx2 bonded to an aromatic ring bonded to the sulfur atom in the formula is 3 or more, and Rx1 and Rx2 represent a fluorine atom or a hydrogen atom

公开(公告)号：US10941253B2

公开(公告)日：2021-03-09

申请号：US15895588

申请日：2018-02-13

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  TOKYO INSTITUTE OF TECHNOLOGY

Inventor： Teruaki Hayakawa ,  Seina Yamazaki ,  Rin Odashima ,  Takehiro Seshimo ,  Daisuke Kawana ,  Akiyoshi Yamazaki

IPC: C08G77/20 ,  C08G81/02 ,  C08L83/08 ,  C08F299/08 ,  C08F297/02 ,  C08G77/442 ,  C08L83/10 ,  C08F220/18 ,  C08F212/08 ,  B05D3/10 ,  C09D7/20 ,  B32B27/28

Abstract: A block copolymer including a first block and a second block, the first block consisting of a polymer (P1) having a repeating structure of a structural unit (u1) containing in a side chain thereof a hyperbranched structure containing a silicon atom.

公开(公告)号：US20210157234A1

公开(公告)日：2021-05-27

申请号：US17090269

申请日：2020-11-05

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Rin Odashima ,  Takashi Nagamine ,  Takuya Ikeda

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F220/18

Abstract: A resist composition which contains a resin component (A1) having a constitutional unit (a01) represented by General Formula (a01-1) and a constitutional unit (a02) represented by General Formula (a02-1), in which a content of an acid generator component (B) is 20 parts by mass or more and a content of a photodegradable base component (D1) is 5 parts by mass or more, in Formula (a01-1), Ra01 represents an aromatic hydrocarbon group which may have a substituent, Ra02 and Ra03 each independently represent a hydrocarbon group which may have a substituent, and Ra02 and Ra03 may be bonded to each other to form a ring, in Formula (a02-1), Wax0 represents a divalent aromatic hydrocarbon group

公开(公告)号：US11261299B2

公开(公告)日：2022-03-01

申请号：US16286232

申请日：2019-02-26

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  TOKYO INSTITUTE OF TECHNOLOGY

Inventor： Akiyoshi Yamazaki ,  Daisuke Kawana ,  Takehiro Seshimo ,  Teruaki Hayakawa ,  Lei Dong ,  Rin Odashima

IPC: C08F283/12 ,  C08G77/04 ,  G03F7/20 ,  C08G77/442 ,  C08G77/26 ,  C08G77/28

Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 represents an organic group having a polar group).

公开(公告)号：US20240425440A1

公开(公告)日：2024-12-26

申请号：US18697720

申请日：2022-10-20

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Rin Odashima ,  Hiroki Kato

IPC: C07C51/41 ,  G03F7/004

Abstract: A method for producing an acid generator including reacting a carboxylic acid represented by Formula (d0-1) having a pKa of 0.50 or more with at least one of a nitrogen-containing base compound and an onium compound to obtain an intermediate represented by Formula (d0-p), and subjecting the intermediate (d0-p) to an ion exchange reaction with a compound represented by Formula (c0) to obtain a compound represented by Formula (d0). In the formulae, X0 represents a bromine atom or an iodine atom, Rm represents a hydroxy group, nb1 represents an integer in a range of 1 to 5, 1≤nb1+nb2≤5 is satisfied, Yd represents a divalent linking group or a single bond, Mpm′+ represents an organic ammonium cation having a logPOW of 4.8 or less or an onium cation having a logPOW of 4.8 or less, X− represents a counter anion, and Mm+ represents an onium cation.

公开(公告)号：US20240302741A1

公开(公告)日：2024-09-12

申请号：US18568071

申请日：2022-06-10

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Shuichi Ishii ,  Hiroki Kato ,  KhanhTin Nguyen ,  Takuya Ikeda ,  Koshi Onishi ,  Rin Odashima ,  Tetsuo Fujinami ,  Seiji Todoroki ,  Ryo Kawatani

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: A resist composition that contains a resin component having a constitutional unit containing an acid-dissociable group represented by General Formula (a01-r) below and contains an acid generator component containing a compound represented by General Formula (b0) below. In General Formula (a01-r), Ra01 and Ra02 represent a saturated aliphatic hydrocarbon group, Ra01 and Ra02 may be bonded to each other to form an alicyclic group. Ra03 to Ra05 represent an aliphatic hydrocarbon group and two or more of Ra03 to Ra05 may be bonded to each other to form an alicyclic group. In General Formula (b-0), X0 represents an iodine atom, Rm represents a hydroxy group, nb1 represents an integer in a range of 1 to 5, nb2 represents an integer in a range of 0 to 4, 1≤nb1+nb2≤5, Yb0 represents a divalent linking group, Vb0 represents an alkylene group, R0 represents a fluorinated alkyl group having 1 to 5 carbon atoms, and Mm+ represents an m-valent organic cation

公开(公告)号：US11560444B2

公开(公告)日：2023-01-24

申请号：US16780643

申请日：2020-02-03

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  TOKYO INSTITUTE OF TECHNOLOGY

Inventor： Teruaki Hayakawa ,  Seina Yamazaki ,  Akiyoshi Yamazaki ,  Daisuke Kawana ,  Yoshitaka Komuro ,  Takaya Maehashi ,  Rin Odashima

IPC: C08F297/02 ,  C09D153/00

Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: In which RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 is a group derived from a compound represented by formula SHRt1, wherein Rt1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.

公开(公告)号：US20210063878A1

公开(公告)日：2021-03-04

申请号：US16999755

申请日：2020-08-21

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takashi Nagamine ,  Rin Odashima ,  Takuya Ikeda

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F220/68

Abstract: A resist composition including a base component (A) and an acid-generator component (B), the base component (A) including a resin component (A1) including a structural unit (a0) represented by formula (a0-1), the amount of the structural unit (a0) within the resin component (A1), based on the combined total (100 mol %) of all structural units constituting the resin component (A1) being 58 to 80 mol % (in the formula, Ra01 represents an aromatic hydrocarbon group; Ra02 and Ra03 each independently represents a hydrocarbon group, provided that Ra02 and Ra03 may be mutually bonded to form a ring