专利检索 ap:("TOKYO ELECTRON LIMITED") AND inv:"Kohei Yamada" 第 1 页

1.

发明授权
Cleaning apparatus and cleaning method of substrate processing apparatus 有权

公开(公告)号：US11295965B2

公开(公告)日：2022-04-05

申请号：US16188671

申请日：2018-11-13

申请人： TOKYO ELECTRON LIMITED

发明人： Kohei Yamada , Hiroaki Inadomi , Satoshi Biwa

IPC分类号： H01L21/67 , H01L21/02 , H01L21/677 , B08B9/093 , B08B3/02

摘要： A cleaning apparatus of a substrate processing apparatus according to an exemplary embodiment includes a nozzle and a scanner. The nozzle ejects a gas toward in an inner wall surface of a processing chamber in which a substrate is processed. The scanner causes the nozzle to scan along the inner wall surface of the processing chamber in the processing chamber.