公开(公告)号：US10508353B2

公开(公告)日：2019-12-17

申请号：US15625639

申请日：2017-06-16

申请人： Stamford Devices Ltd.

发明人： Hong Xu

IPC分类号： C25D7/00 ,  B41J2/16 ,  C25D5/02 ,  C25D5/10 ,  C25D1/00 ,  B05B17/00 ,  C25D3/38 ,  C25D3/46 ,  C25D3/48 ,  C25D3/54 ,  C25D5/34 ,  C25D5/48 ,  C25D5/54

摘要： In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.

公开(公告)号：US20170350030A1

公开(公告)日：2017-12-07

申请号：US15625639

申请日：2017-06-16

申请人： Stamford Devices Ltd.

发明人： Hong Xu

IPC分类号： C25D7/00 ,  B05B17/00 ,  C25D5/34 ,  C25D5/10 ,  C25D5/02 ,  C25D5/48 ,  C25D3/48 ,  C25D3/46 ,  C25D3/38 ,  C25D1/00 ,  B41J2/16 ,  C25D5/54 ,  C25D3/54

摘要： In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.