公开(公告)号：US20170248466A1

公开(公告)日：2017-08-31

申请号：US15376541

申请日：2016-12-12

Applicant: SpectraSensors, Inc.

Inventor： ALFRED FEITISCH ,  Xiang Liu ,  Chih-Husan Chang ,  Hsu-Hung Huang

IPC: G01J3/02 ,  G01J3/42

CPC classification number: G01J3/0291 ,  G01J3/027 ,  G01J3/42

Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.

公开(公告)号：US10072980B2

公开(公告)日：2018-09-11

申请号：US15376541

申请日：2016-12-12

Applicant: SpectraSensors, Inc.

Inventor： Alfred Feitisch ,  Xiang Liu ,  Chih-Husan Chang ,  Hsu-Hung Huang

IPC: G01J3/46 ,  G01J3/02 ,  G01J3/42

CPC classification number: G01J3/0291 ,  G01J3/027 ,  G01J3/42

Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.

公开(公告)号：US09518866B2

公开(公告)日：2016-12-13

申请号：US14466839

申请日：2014-08-22

Applicant: SpectraSensors, Inc.

Inventor： Alfred Feitisch ,  Xiang Liu ,  Chih-Husan Chang ,  Hsu-Hung Huang

IPC: G01J3/46 ,  G01J3/02 ,  G01J3/42

CPC classification number: G01J3/0291 ,  G01J3/027 ,  G01J3/42

Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.

Abstract translation: 至少一个光源被配置为将至少一个光束发射到吸收介质的样品体积中。 另外，至少一个检测器被定位成检测由至少一个光源发射的光束的至少一部分。 此外，至少一个光束修改元件位于所述至少一个检测器和所述至少一个光源之间，以选择性地改变以下中的至少一个：（i）由所述至少一个光源发射的光束的形状的功率强度或（ii） 由所述至少一个检测器检测的至少一个光源。 控制电路耦合到光束修改元件。 描述了相关的装置方法，制品，系统等。

公开(公告)号：US20160054178A1

公开(公告)日：2016-02-25

申请号：US14466839

申请日：2014-08-22

Applicant: SpectraSensors, Inc.

Inventor： Alfred Feitisch ,  Xiang Liu ,  Chih-Husan Chang ,  Hsu-Hung Huang

IPC: G01J3/02

CPC classification number: G01J3/0291 ,  G01J3/027 ,  G01J3/42

Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.

Abstract translation: 至少一个光源被配置为将至少一个光束发射到吸收介质的样品体积中。 另外，至少一个检测器被定位成检测由至少一个光源发射的光束的至少一部分。 此外，至少一个光束修改元件位于所述至少一个检测器和所述至少一个光源之间，以选择性地改变以下中的至少一个：（i）由所述至少一个光源发射的光束的形状的功率强度或（ii） 由所述至少一个检测器检测的至少一个光源。 控制电路耦合到光束修改元件。 描述了相关的装置方法，制品，系统等。