公开(公告)号：US20160126098A1

公开(公告)日：2016-05-05

申请号：US14933957

申请日：2015-11-05

申请人： SolarCity Corporation

发明人： Wei Wang ,  Jianming Fu ,  Zheng Xu ,  Kenneth Reese Reynolds ,  Ollivier Jacky Lefevre

IPC分类号： H01L21/225 ,  C23C16/458 ,  C23C16/513

CPC分类号： H01L21/2253 ,  C23C14/08 ,  C23C14/086 ,  C23C14/24 ,  C23C14/28 ,  C23C14/32 ,  C23C14/50 ,  C23C14/56 ,  C23C14/562 ,  C23C14/564 ,  C23C16/458 ,  C23C16/513 ,  H01J9/14 ,  H01J37/32009 ,  H01L31/022466 ,  H01L31/1884

摘要： A substrate processing system that includes a substrate processing chamber having one or more sidewalls that at least partially define a substrate processing region and extend away from a bottom wall of the substrate processing chamber at an obtuse angle; a source material holder configured to hold a source material within the substrate processing region; a plasma gun operatively coupled to introduce a plasma beam into the substrate processing region; one or more magnets operatively arranged to generate a magnetic field that guides the plasma beam to the source material holder; and a substrate carrier configured to hold one or more substrates within the substrate processing region.

摘要翻译： 一种衬底处理系统，其包括具有一个或多个侧壁的衬底处理室，所述侧壁至少部分地限定衬底处理区域并且以钝角从衬底处理室的底壁延伸; 源材料保持器，其构造成将源材料保持在所述基板处理区域内; 等离子体枪，可操作地耦合以将等离子体束引入衬底处理区域; 一个或多个磁体可操作地布置成产生将等离子体束引导到源材料保持器的磁场; 以及衬底载体，其构造成在衬底处理区域内保持一个或多个衬底。

公开(公告)号：US09460925B2

公开(公告)日：2016-10-04

申请号：US14933957

申请日：2015-11-05

申请人： SolarCity Corporation

发明人： Wei Wang ,  Jianming Fu ,  Zheng Xu ,  Kenneth Reese Reynolds ,  Ollivier Jacky Lefevre

IPC分类号： H01L27/01 ,  H01L27/12 ,  H01L31/0392 ,  H01L21/225 ,  C23C16/513 ,  C23C16/458 ,  C23C14/08 ,  C23C14/28 ,  C23C14/56 ,  H01L31/18 ,  H01J37/32

CPC分类号： H01L21/2253 ,  C23C14/08 ,  C23C14/086 ,  C23C14/24 ,  C23C14/28 ,  C23C14/32 ,  C23C14/50 ,  C23C14/56 ,  C23C14/562 ,  C23C14/564 ,  C23C16/458 ,  C23C16/513 ,  H01J9/14 ,  H01J37/32009 ,  H01L31/022466 ,  H01L31/1884

摘要： A substrate processing system that includes a substrate processing chamber having one or more sidewalls that at least partially define a substrate processing region and extend away from a bottom wall of the substrate processing chamber at an obtuse angle; a source material holder configured to hold a source material within the substrate processing region; a plasma gun operatively coupled to introduce a plasma beam into the substrate processing region; one or more magnets operatively arranged to generate a magnetic field that guides the plasma beam to the source material holder; and a substrate carrier configured to hold one or more substrates within the substrate processing region.

摘要翻译： 一种衬底处理系统，其包括具有一个或多个侧壁的衬底处理室，所述侧壁至少部分地限定衬底处理区域并且以钝角从衬底处理室的底壁延伸; 源材料保持器，其构造成将源材料保持在所述基板处理区域内; 等离子体枪，可操作地耦合以将等离子体束引入衬底处理区域; 一个或多个磁体可操作地布置成产生将等离子体束引导到源材料保持器的磁场; 以及衬底载体，其构造成在衬底处理区域内保持一个或多个衬底。