公开(公告)号：US20010050212A1

公开(公告)日：2001-12-13

申请号：US09770389

申请日：2001-01-29

Applicant: Shimadzu Mectem, Inc.

Inventor： Eiji Nakatsukasa ,  Kanji Mikami ,  Katsutoshi Kamoto

IPC: B65G025/00

CPC classification number: F27D3/0024 ,  C21D9/0018 ,  F27B2017/0091 ,  F27D2001/1891 ,  F27D2099/0098

Abstract: A continuous treatment apparatus is provided that resists thermal shock and treatment gases and correctly transfers treated objects. An urging mechanism 9 that urges a treated object w is adapted to transfer a treated object w by reciprocating rack member 91 using a pinion 92 in separating compartments 6 between treatment chambers 1, 2, 3, and 4. This arrangement eliminates the need to install rack members 91 and pinion 92 in a severe atomsphere.

Abstract translation: 提供了一种能够抵抗热冲击和处理气体并正确地传送处理过的物体的连续处理装置。 推动被处理物体w的推压机构9适于通过往复式齿条构件91使用小齿轮92在处理室1,2,3和4之间的分隔室6内传送处理物体W.这种布置消除了安装 齿条构件91和小齿轮92处于严格的原子层。