GAS-LIFT CONTROL
    2.
    发明公开
    GAS-LIFT CONTROL 审中-公开

    公开(公告)号:US20240328289A1

    公开(公告)日:2024-10-03

    申请号:US18683812

    申请日:2022-09-08

    CPC classification number: E21B43/122 E21B49/087

    Abstract: A method can include receiving a number of samples of liquid production values and associated gas-lift injection rates for one of one or more wells; determining a prospective optimal gas-lift injection rate for the one of the one or more wells via a regression that fits the number of samples; responsive to the prospective optimal gas-lift injection rate satisfying one or more gas-lift injection rate criteria, issuing an instruction to implement the prospective optimal gas-lift injection rate for the one of the one or more wells; receiving a new sample as a measured liquid production value for the implemented prospective optimal gas-lift injection rate and responsive to satisfaction of one or more compliance criteria; and replacing one of the number of samples with the new sample.

    Gas-lift control
    4.
    发明授权

    公开(公告)号:US12140003B2

    公开(公告)日:2024-11-12

    申请号:US18683812

    申请日:2022-09-08

    Abstract: A method can include receiving a number of samples of liquid production values and associated gas-lift injection rates for one of one or more wells; determining a prospective optimal gas-lift injection rate for the one of the one or more wells via a regression that fits the number of samples; responsive to the prospective optimal gas-lift injection rate satisfying one or more gas-lift injection rate criteria, issuing an instruction to implement the prospective optimal gas-lift injection rate for the one of the one or more wells; receiving a new sample as a measured liquid production value for the implemented prospective optimal gas-lift injection rate and responsive to satisfaction of one or more compliance criteria; and replacing one of the number of samples with the new sample.

    AUTOMATED SYSTEM FOR MANAGING ANNULAR GAS IN A PRODUCTION WELL

    公开(公告)号:US20240117719A1

    公开(公告)日:2024-04-11

    申请号:US18263903

    申请日:2022-02-03

    CPC classification number: E21B43/121 E21B34/02 E21B47/06

    Abstract: An automated system for managing gas in an annulus of a production well at a well site, the automated system including: an electrically-controlled valve fluidly coupled to the annulus of the production well, wherein the valve is located at or near the surface at the well site; at least one well sensor configured to measure operational characteristics of the production well at or near the surface; and a gateway device, located at the well site and operably coupled to the valve and the at least one well sensor, wherein the gateway device is configured to collect first sensor data communicated from the at least one well sensor, and process the first sensor data in autonomous control operations that automatically generate and issue commands that are communicated from the gateway device to the valve to regulate the outflow of accumulated gas from the annulus of the production well over time.

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