METHOD OF WAFER DICING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICES USING THE SAME

    公开(公告)号:US20240290658A1

    公开(公告)日:2024-08-29

    申请号:US18496531

    申请日:2023-10-27

    CPC classification number: H01L21/78 H01L21/268

    Abstract: Provided is a method of dicing a wafer, the method including preparing a wafer having a plurality of device formation regions and a scribe lane region defining the plurality of device formation regions, forming a plurality of semiconductor devices in the plurality of device formation regions of the wafer, irradiating a first laser beam and a second laser beam of a wavelength different from the first laser beam along the scribe lane region to form a plurality of internal cracks in the wafer, and separating the plurality of semiconductor devices along the plurality of internal cracks, wherein the first laser beam includes a plurality of pulses sequentially emitted from a laser apparatus, and the second laser beam is continuous wave light emitted from the laser apparatus.

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