-
公开(公告)号：US20250165693A1
公开(公告)日：2025-05-22
申请号：US18752925
申请日：2024-06-25
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sangchul YEO , Jaewon YANG , Seungju SHIN
IPC: G06F30/392
Abstract: Provided is a mask layout design method including acquiring a plurality of unique patterns, clustering and sampling the plurality of unique patterns, and inspecting the plurality of unique patterns which have been clustered and sampled, wherein the clustering and sampling of the plurality of unique patterns is performed based on symmetry of the plurality of unique patterns.
Search Results
1
records
(took 0.012 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
