公开(公告)号：US20180174802A1

公开(公告)日：2018-06-21

申请号：US15804304

申请日：2017-11-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seungkyu LIM ,  DOUGYONG SUNG ,  Myoung Soo PARK ,  Jaehoon KIM ,  Eunyoung LEE ,  Seiwon CHUNG ,  YOSHIHISA HIRANO

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32119 ,  H01J37/3211 ,  H01J37/32183 ,  H01J37/32642 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6831

Abstract: A dielectric window, a plasma system including the same, a method of fabricating the same, and a method of manufacturing a semiconductor device are provided. The method of manufacturing the semiconductor device may include steps of providing a substrate in a plasma chamber, performing a plasma treatment on a surface of the substrate, and removing the substrate from the plasma chamber, wherein the plasma chamber comprises the dielectric window. The dielectric window may include a dielectric material disk with at least one void, a filler filled in the void to allow the dielectric material disk to have a flat surface, and a passivation layer provided on the filler and the dielectric material disk.