公开(公告)号：US20230085456A1

公开(公告)日：2023-03-16

申请号：US17859472

申请日：2022-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyo-Suk Chae ,  Dongsik Kong ,  Youngwook Park ,  Jihoon Kim ,  Myung-Hyun Baek ,  Ju Hyung We ,  Jun-Bum Lee

IPC: H01L29/423 ,  H01L21/306 ,  H01L21/02 ,  H01L21/762 ,  H01L21/768

Abstract: Disclosed are a semiconductor device and a method of fabricating the same. The semiconductor device may include a substrate having a groove therein extending in a first direction, a gate insulating layer in the groove, a first conductive pattern in the groove and on the gate insulating layer, and a word line capping pattern in the groove and on the first conductive pattern. The first conductive pattern may include a first material and may include a first conductive portion adjacent to the word line capping pattern and a second conductive portion adjacent to a bottom end of the groove. A largest dimension of a grain of the first material of the first conductive portion may be equal to or larger than that of the first material of the second conductive portion.