公开(公告)号：US20180182600A1

公开(公告)日：2018-06-28

申请号：US15826665

申请日：2017-11-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： MinKyu SOHN ,  DOUGYONG SUNG ,  SeungBo SHIM ,  JaeWon JEONG ,  PETER BYUNGHOON HAN

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32146 ,  H01J37/32972 ,  H01J2237/327 ,  H01J2237/3347 ,  H01L21/67069 ,  H01L21/67253

Abstract: A plasma system includes an electrode and an RF power supply unit supplying an RF power to the electrode to generate a plasma on the electrode. The RF power is provided in a pulse having a valley-shaped portion during an on-pulsing interval of the pulse. The valley-shaped portion is defined by a valley angle and a valley width. By controlling the valley angle and the valley width, the plasma may control the etching of a substrate.