公开(公告)号：US20240355583A1

公开(公告)日：2024-10-24

申请号：US18431163

申请日：2024-02-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Naohiko OKUNISHI ,  Hyeong Mo KANG ,  Nam Kyun KIM ,  Seong Sik NAM ,  Seung Bo SHIM

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/458 ,  C23C16/509 ,  C23C16/52

CPC classification number: H01J37/32137 ,  C23C16/45565 ,  C23C16/4583 ,  C23C16/509 ,  C23C16/52 ,  H01J37/32183 ,  H01J37/32541

Abstract: A plasma processing apparatus comprises a shower head configured to receive an electrode therein, and a variable impedance controller on the shower head. The variable impedance controller includes a first member spaced apart from the shower head and arranged along a circumference of the shower head, and a second member on the first member and configured to rotate. The variable impedance controller is configured to control an impedance by changing the impedance resulting from the first member and the second member as at least one contact point between the first member and the second member is changed according to rotation of the second member.