公开(公告)号：US20250135600A1

公开(公告)日：2025-05-01

申请号：US18906603

申请日：2024-10-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Youngtaek KIM ,  Domin KIM ,  Sungyong PARK ,  Chansoo PARK ,  Kyoungwhan OH ,  Jaemin JUNG ,  Hoseop CHOI

IPC: B24B37/27 ,  B24B37/015

Abstract: A polishing head may include a substrate carrier detachably secured to a driving shaft and to pressurize and rotate a substrate, the substrate carrier includes a flexible membrane, wherein the flexible membrane includes a main thin film having a first surface to be in contact with the substrate and a second surface opposite to the first surface and a plurality of vertical thin films extending from the main thin film in a vertical direction to define a plurality of pressurizing chambers that are divided along a radial direction about a central axis; a plurality of temperature elements disposed under the plurality of pressurizing chambers in the main thin film and configured to apply local heat to the substrate; and a plurality of pressure elements respectively disposed on the plurality of temperature elements in the main thin film and configured to apply local pressure to the main thin film.