公开(公告)号：US20160025484A1

公开(公告)日：2016-01-28

申请号：US14638702

申请日：2015-03-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Tae-Sun KIM ,  Jae-Kyung SEO ,  Kwang-Sub YOON ,  Bi-Zheng WANG ,  Ki-Man LEE ,  Bum-Joon YOUN

IPC: G01B11/27

CPC classification number: G03F7/70633

Abstract: Example embodiments relate to an overlay measurement device and method of forming an overlay pattern. The overlay measurement device includes a tray part with a substrate having a first region and a second region, a measurement part which measures an overlay of a first or second element, and a processor part which receives data measured by the measurement part and corrects the position of the first or second element, wherein the substrate comprises a first layer comprising the first overlay marks, a second layer comprising the second overlay marks, which intersects the first direction, in the second region and not comprising overlay marks which are used to measure the overlay of the second element; and the photoresist pattern which is formed on the first and second layers and overlaps the first and second overlay marks.

Abstract translation: 示例性实施例涉及覆盖测量设备和形成覆盖图案的方法。 覆盖测量装置包括具有第一区域和第二区域的基板的托盘部分，测量第一或第二元件的覆盖层的测量部分和接收由测量部件测量的数据并且校正位置的处理器部件 的第一或第二元件，其中所述基底包括包含所述第一覆盖标记的第一层，在所述第二区域中包括与所述第一方向相交的所述第二覆盖标记的第二层，并且不包括用于测量所述第一覆盖标记的覆盖标记 覆盖第二个元素; 以及形成在第一层和第二层上并与第一和第二覆盖标记重叠的光致抗蚀剂图案。